Chemical Vapor Deposition: Solution for Microelectronics, Optics
Chemical vapor deposition (CVD) is a versatile thin film deposition technique used extensively in industrial manufacturing processes. Through a series of chemical reactions between volatile precursors, it can deposit a wide variety of thin films on substrates for applications in microelectronics, optics, protective coatings and more. Some of its advantages include excellent step coverage, precise control over deposition parameters, and relatively low processing temperatures.